Reactive Sputter Deposition of NiCrxOy Films Using NiCr Target

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XRD Characterization of AlN Thin Films Prepared by Reactive RF-Sputter Deposition

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Ion sputter-deposition and in-air crystallisation of Cr2AlC films

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Sputter deposition processes

Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based upon ion bombardment of a source material, the target. Ion bombardment results in a vapor due to a purely physical process, i.e. the sputtering of the target material. Hence, this technique is part of the class of physical vapor deposition techniques, which includes, for example, thermal ev...

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ژورنال

عنوان ژورنال: Materials Science

سال: 2016

ISSN: 2029-7289,1392-1320

DOI: 10.5755/j01.ms.22.2.8563