Reactive Sputter Deposition of NiCrxOy Films Using NiCr Target

XRD Characterization of AlN Thin Films Prepared by Reactive RF-Sputter Deposition

AlN thin films have been grown on R((1-12) surface-cut)-Al2O3, SiO2-glass and C((001) surface-cut)-Al2O3 substrates, by using a reactive-RF-sputter-deposition method. X-ray diffraction (XRD) shows that AlN film has (110) orientation of wurtzite crystal structure for R-Al2O3 and (001) orientation for SiO2-glass and C-Al2O3 substrates. The film thickness was analyzed by Rutherford backscattering ...

CuInS2 Thin Films for Photovoltaic: RF Reactive Sputter Deposition and Characterization

Sputter deposition of calcium phosphate/titanium dioxide hybrid thin films

The application of either hydroxyapatite (HA) or titanium dioxide (TiO2) as coatings onto existing bioinert materials has been explored as the key route for enhancing the surface properties of hard tissue implant devices. However, it has been proposed that composite HA/TiO2 coatings may provide significant advantages for the application of such surfaces. This work reports on the surface propert...

Ion sputter-deposition and in-air crystallisation of Cr2AlC films

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Sputter deposition processes

Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based upon ion bombardment of a source material, the target. Ion bombardment results in a vapor due to a purely physical process, i.e. the sputtering of the target material. Hence, this technique is part of the class of physical vapor deposition techniques, which includes, for example, thermal ev...