Reactive Sputter Deposition of NiCrxOy Films Using NiCr Target
نویسندگان
چکیده
منابع مشابه
XRD Characterization of AlN Thin Films Prepared by Reactive RF-Sputter Deposition
AlN thin films have been grown on R((1-12) surface-cut)-Al2O3, SiO2-glass and C((001) surface-cut)-Al2O3 substrates, by using a reactive-RF-sputter-deposition method. X-ray diffraction (XRD) shows that AlN film has (110) orientation of wurtzite crystal structure for R-Al2O3 and (001) orientation for SiO2-glass and C-Al2O3 substrates. The film thickness was analyzed by Rutherford backscattering ...
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متن کاملSputter deposition processes
Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based upon ion bombardment of a source material, the target. Ion bombardment results in a vapor due to a purely physical process, i.e. the sputtering of the target material. Hence, this technique is part of the class of physical vapor deposition techniques, which includes, for example, thermal ev...
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ژورنال
عنوان ژورنال: Materials Science
سال: 2016
ISSN: 2029-7289,1392-1320
DOI: 10.5755/j01.ms.22.2.8563